Optical and X-ray techniques are powerful ways to characterize semiconductor thin films. They can be used to measure film thickness, purity and crystalline quality, and for compositional analysis. Modern techniques are fast, turn-key, and generally non-destructive, allowing for rapid assessment of material properties. This course describes the fundamentals of optical and X-ray characterization and provides real-world examples of how they are used in semiconductor manufacturing.
Optical and X-Ray Characterization
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Optical and X-Ray Characterization
This course is part of Semiconductor Characterization Specialization
Instructor: Trevor Thornton
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30 reviews
Intermediate level
Recommended experience
4 hours to complete
Flexible schedule
Learn at your own pace
What you'll learn
Describe the use of light to measure the thickness and refractive index of thin transparent films.
Explain how light is absorbed and emitted by semiconductors.
Explain the advantages and limitations of optical and X-ray characterization.
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Assessments
5 assignments
Taught in English
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This course is part of the Semiconductor Characterization Specialization
When you enroll in this course, you'll also be enrolled in this Specialization.
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Explore more from Mechanical Engineering
Status: Free TrialArizona State University
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KN
Reviewed on May 8, 2024
Quick introduction and review of important topics. I wish if more such courses are introduced.
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