Electron and ion beams are widely used for both qualitative and quantitative analysis of semiconductor materials and devices. They can be used to image structures with sub-nm resolution and to provide information about elemental composition and dopant concentration. This course describes the fundamentals of electron and ion beam characterization and includes a project that analyzes the surface roughness of a solar cell.
Electron and Ion Beam Characterization
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Electron and Ion Beam Characterization
This course is part of Semiconductor Characterization Specialization
Instructor: Trevor Thornton
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17 reviews
Intermediate level
Recommended experience
5 hours to complete
Flexible schedule
Learn at your own pace
What you'll learn
Explain the interaction of electron and ion beams with semiconductor materials.
Describe the constituent components of electron and ion beam characterization systems.
Describe applications of electron and ion beam characterization.
Skills you'll gain
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Assessments
5 assignments
Taught in English
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This course is part of the Semiconductor Characterization Specialization
When you enroll in this course, you'll also be enrolled in this Specialization.
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